کندوپاش (اسپاترینگ) یکی از روش‌های لایه‌نشانی فیزیکی است. اسپاترینگ به طور عمده برای تولید فیلم نازک از چند نانومتر تا چند میکرومتر مورد استفاده قرار می‌گیرد. فرآیند اسپاترینگ عبارت است از کندوپاش اتم‌ها و مولکولهای ماده هدف (تارگت) و ایجاد یک فیلم نازک بر روی یک زیر لایه (بستره). یکی از ملزومات اسپاترینگ، تهیه تارگت‌های مختلف اعم از تارگت‌های فلزی، سرامیکی و آلیاژی است. در لیست زیر می‌توانید تارگت‌های پرکاربرد از دسته تارگت‌های سرامیکی، خالص و آلیاژی را بیابید. این تارگت‌ها در شکل‌های مختلف Disk, Plate, Rectangle و در ابعاد مختلف در دسترس هستند. لبینت با افتخار اعلام میدارد که تامین کننده انواع مختلف تارگت‌های کندوپاش از شرکت‌های معتبر می‌باشد. تعدادی از تارگت‌های پرکاربرد در لیست محصولات قرار داده شده است؛ اما دیگر محصولات کمپانی‌های معتبر نیز قابلیت ثبت سفارش در لبینت را دارند. در صورتی که محصول مورد نظر خود را در میان محصولات لبینت نیافتید، برای ثبت سفارش محصول مورد نظر به صفحه سفارش کالا مراجعه نمایید.
Aluminum (Al)
Antimony (Sb)
Bismuth (Bi)
Boron (B)
Cadmium (Cd)
Carbon (C)
Cerium (Ce)
Chromium (Cr)
Cobalt (Co)
Copper (Cu)
Dysprosium (Dy)
Erbium (Er)
Europium (Eu)
Gadolinium (Gd)
Germanium (Ge)
Gold (Au)
Graphite (C)
Hafnium (Hf)
Holmium (Ho)
Indium (In)
Iridium (Ir)
Iron (Fe)
Lanthanum (La)
Lead (Pb)
Lutetium (Lu)
Magnesium (Mg)
Manganese (Mn)
Molybdenum (Mo)
Neodymium (Nd)
Nickel (Ni)
Niobium ( Nb)
Palladium (Pd)
Platinum (Pt)
Praseodymium (Pr)
Rhenium (Re)
Ruthenium (Ru)
Samarium (Sm)
Scandium (Sc)
Selenium (Se)
Silicon (Si)
Silver (Ag)
Tantalum (Ta)
Tellurium (Te)
Terbium (Tb)
Thulium (Tm)
Tin (Sn)
Titanium (Ti)
Tungsten (W)
Vanadium (V)
Ytterbium (Yb)
Yttrium (Y)
Zinc (Zn)
Zirconium (Zr)
Aluminum Magnesium(Al-Mg)
Aluminum Chromium Target (Al-Cr)
Aluminum Neodymium (Al-Nd)
Aluminum Scandium – AlSc
 Aluminum Copper Target (Al-Cu)
Aluminum Silicon (Al-Si)
Aluminum Silicon Copper (AlSiCu)
Aluminum Silver (Al-Ag)
Aluminum Tantalum (AlTa)
Cerium Gadolinium (Ce-Gd)
Cerium Samarium (Ce-Sm)
Chromium Silicon (Cr-Si)
Chromium- Silicon Monoxide (Cr-SiO)
Cobalt Chromium (Co-Cr)
Cobalt Iron (Co-Fe)
Cobalt Nickel  (Co-Ni)
Cobalt Iron Boron (Co-Fe-B)
Copper Cobalt (Cu-Co)
Copper Gallium (Cu-Ga)
Copper Indium (CuIn)
Copper Nickel (Cu-Ni)
Copper  Zirconium (Cu-Zr)
Hafnium Iron (Hf-Fe)
Iron  Boron (Fe-B)
Iron Carbon (Fe-C)
Iron Manganese (Fe-Mn)
Iridium Manganese (Ir-Mn)
Iridium Rhenium (Ir-Re)
Indium Tin (In-Sn)
Molybdenum Silicon (Mo-Si)
Molybdenum Noibium (MoNb)
Nickel Aluminum (Ni-Al)
Nickel-Chromium (Ni-Cr)
Nickel-Chromium  Silicon (Ni-Cr-Si)
Nickel Iron – NiFe
Nickel Niobium Titanium – NiNbTi
Nickel Titanium – NiTi
Nickel Vanadium – NiV
Niobium Tantalum – NbTa
Samarium  Cobalt  – SmCo
Silver Copper – AgCu
Silver Tin – AgSn
Tantalum  Aluminum – TaAl
Tantalum Tungstem – TaW
Terbium Dysprosium Iron – TbDyFe
Terbium  Iron – TbFe
Titanium Aluminum – TiAl
Titanium Nickel – TiNi
Titanium Chromium – TiCr
Tungsten Rhenium – WRe
Tungsten Titanium – WTi
Zirconium Aluminum – ZrAl
Zirconium Iron – ZrFe
Zirconium Nickel – ZrNi
Zirconium Niobium – ZrNb
Zirconium Titanium – ZrTi
Zirconium Yttrium – ZrY
Zinc Aluminum Target – ZnAl
Zinc Magnesium – ZnMg

 

:Special targets
Cr-SiO
CuO/Al2O3
CIGS (CuInGaSe)
CdS
CuInO2
GaP
GZO
LaNbO3
LiNbO3
InGaZnO (IGZO)
InP
PZT
SrBaTiO3
SrRuO3
SrZrO3
NbOx
TiOx
TiO2-Nb2O5
YBCO
ZrOx
:Oxid Ceramic Sputtering Target
Aluminum  Oxide Ceramic Sputtering Targets – Al2O3
Antimony  Oxide Ceramic Sputtering Targets – Sb2O3
Antimony:Tin Dioxide (Sb:SnO2) (ATO)
Barium Titanate (BaTiO3) Sputtering Targets
Bismuth Oxide (Bi2O3) Sputtering Targets
Cerium oxide (CeO2) Sputtering Targets
Cerium fluoride (CeF3) Sputtering Targets
Chromium Oxide (Cr2O3) Sputtering Targets
Copper Oxide (CuO) Sputtering Targets
Dysprosium Oxide (Dy2O3) Targets
Erbium Oxide (Er2O3) Sputtering Targets
Europium Oxide (Eu2O3) Sputtering Targets
Gadolinium Oxide (Gd2O3) Sputtering Targets
Hafnium Oxide  (HfO2 ) Sputtering Targets
Holmium Oxide (Ho2O3) Sputtering Targets
Indium Oxide (In2O3) Sputtering Targets
Indium Tin Oxide(ITO) Sputtering Targets
Indium Zinc Oxide (IZO) Sputtering Targets
IGZO ( In2O3+Ga2O3+ZnO )
Iron Oxide (Fe2O3) Sputtering Targets
Iron Oxide (Fe3O4) Sputtering Targets
Lanthanum Aluminate (LaAl2O3)
LSMO ( La0.67Sr0.33MnO3 ) sputtering target
Lead  Zirconate (PbZrO3) Sputtering Targets
Lead Oxide (PbO) Sputtering Targets
Lead Titanate (PbTiO3) Sputtering Targets
Lead Zirconate (PbZrO3) Sputtering Targets
PZT (PbZrO3 + PbTiO3) Sputtering Targets
Lutetium Oxide (Lu2O3) Sputtering Targets
Magnesium Oxide (MgO) Sputtering Targets
Molybdenum Oxide (MoO) Sputtering Targets
Molybdenum Oxide (MoO3) sputtering targets
Neodymium Oxide (Nd2O3) Sputtering targets
Nickel Oxide (NiO) Sputtering Targets
Niobium Pentoxide (Nb2O5) Sputteirng targets
Magnesium Oxide (MgO) Sputtering Targets
Neodymium Oxide (Nd2O3) Sputtering targets
Nickel Oxide (NiO) Sputtering Targets
Niobium Pentoxide (Nb2O5) Sputtering targets
Praseodymium Oxide (Pr6O11) Sputtering targets
Samarium Oxide (Sm2O3) Sputtering Targets
Scandium Oxide (Sc2O3) Sputtering Targets
Silicon Monoxide (SiO) Sputtering Targets
Silicon Dioxide (SiO2) Sputtering Targets
Strontium Titanate (SrTiO3) Sputtering targets
Tantalum Pentoxide (Ta2O5) Sputtering targets
Terbium Oxide (Tb4O7) Sputtering Targets
Thulium Oxide (Tm2O3) Sputtering Targets
Titanium Oxide (Ti2O3) Sputtering Targets
Titanium Oxide (Ti3O5) Sputtering Targets
Titanium Monoxide (TiO) Sputtering Targets
Titanium Dioxide (TiO2) Sputtering Targets
Tungsten Oxide (WO3) Sputtering Targets
Tungsten Oxide (WO2.9) Sputtering Targets
Vanadium Pentoxide (V2O5) sputtering targets
Yttrium Oxide (Y2O3) Sputtering Targets
YBCO(YBaCuO) Sputtering targets
YGBCO(YGdBaCuO) Sputtering targets
GBCO(GdBaCuO) Sputtering targets
Ytterbium Oxide (Yb2O3) Sputtering Targets
Zinc Oxide (ZnO) Sputtering Targets
AZO (Zinc Aluminum Oxide) Sputtering targets
GZO( Ga2O3 doped ZnO) Sputtering Targets
IZO ( In2O3 + ZnO ) Sputtering Targets
Zirconium oxide (ZrO2) Sputtering Targets
ZrO2 doped with Ti Sputtering Targets
YSZ (ZrO2 + Y2O3 stabilized) Sputtering targets
ZrO2 + SiO2 Sputtering Targets
:Nitrid Ceramic Sputtering Target
Aluminum Nitride (AlN) Sputtering Targets
Aluminum Scandium Nitride sputtering target
Boron Nitride (BN) Sputtering Targets
Chrominium Nitride (CrN) Sputtering Targets
Gallium Nitride (GaN) Sputtering Targets
Germanium Nitride (Ge3N4) Sputtering targets
Hafnium Nitride (HfN) Sputtering Targets
Magnesium Nitride (Mg2N3) Sputtering Targets
Niobium Niride (NbN) Sputtering Targets
Silicom Nitride (Si3N4) Sputtering Targets
Tantalum Nitride (TaN) Sputtering Targets
Titanium Carbonitride (TiCN)
Titanium Nitride(TiN) Sputtering Targets
Vanadium Nitride (VN) Sputtering Targets
Zirconium Nitride (ZrN) Sputtering Targets
:Carbide Ceramic Sputtering Target
Boron Carbide(B4C) Sputtering Targets
Chromium Carbide (Cr3C2) Sputtering Targets
Hafnium Carbide(HfC) Sputtering Targets
Iron Carbide (Fe3C) Sputtering Targets
Molybdenum Carbide (Mo2C) Sputtering Targets
Niobium Nitride (NbC) Sputtering Targets
Silicom Carbide (SiC) Sputtering Targets
Tantalum Carbide (TaC) Sputtering Targets
Titanium Carbide(TiC) Sputtering Targets
Titanium Carbonitride (TiCN) Sputtering Targets
Tungsten Carbide (W2C) Sputtering Targets
Tungsten Carbide (WC) Sputtering Targets
Tungsten Carbide Doped with Nickel (WC+Ni)
Tungsten Carbide Doped with Cobalt (WC+Co)
Vanadium Carbide (VC) Sputtering Targets
Zirconium Carbide(ZrC) Sputtering Targets
:Fluoride Ceramic Sputtering Target
Aluminum Fluiride (AlF3) Sputtering Target
Barium Fluoride (BaF2) Sputtering Target
Cadmium Fuoride (CdF2) Sputtering Target
Calcium Fluoride(CaF2) Sputtering Target
Cerium fluoride (CeF3) Sputtering Target
Dysprosium Fluoride (DyF3) Sputtering Target
Erbium Fluoride (ErF3) Sputtering Target
Hafnium Fluoride (HfF4) Sputtering Target
Lanthanum  fluoride(LaF3) Sputtering Target
Lithium Fluoride (LiF) Sputtering Target
Magnesium fluoride  (MgF2) Sputtering Target
Neodymium fluoride(NdF3) Sputtering Target
Potassdium Fluoride (KF) Sputtering Target
Praseodymium Fluoride (PrF3)
Lead Fluoride (PbF2) Sputtering Target
Sodium Fluride (NaF) Sputtering Target
Strontium Fluoride (SrF3) Sputtering Target
Samarium Fluoride (SmF3) Sputtering Target
Cryolite Na3AlF6 Sputtering Target
Ytterbium  Fluoride (YbF3) Sputtering Target
Yttrium Fluride (YF3) Sputtering Target
:Silicide Ceramic Sputtering Target
Chromium Silicide (CrSi2) Sputtering Target
Chromium Silicide (Cr2Si) Sputtering Target
Cobalt Silicide (Co3Si) Sputtering Target
Hafnium Silicide (HfSi2) Sputtering Target
Molybdenum silicide(Mo5Si3) Sputtering Target
Molybdenum Silicide(MoSi2) Sputtering Target
Nickel Silicide (NiSi) Sputtering Target
Niobium Silicide (Nb5Si3) Sputtering Target
Niobium Silicide(NbSi2) Sputtering Target
Tantalum Silicide (Ta5Si3) Sputtering Target
Tantalum Silicide (TaSi2) Sputtering Target
Titanium silicide(Ti5Si3) Sputtering Target
Titanium silicide(TiSi2) Sputtering Target
Tungsten Silicide (WSi2) Sputtering Target
Tungsten Silicide (W5Si3) Sputtering Target
vanadium silicide (V3Si) Sputtering Target
Vanadium Silicide (VSi2) Sputtering Target
Zirconium Silicide (ZrSi2) Sputtering Target
:Boride Ceramic Sputtering Target
Aluminium Diboride (AlB2) Sputtering Targets
Cerium Hexaboride (CeB6) Sputtering Targets
Chromium Boride (Cr2B) Sputtering Target
Chromium Boride (CrB2) Sputtering Target
Chromium Boride (CrB) Sputtering Target
Chromium Boride (Cr5B3) Sputtering Target
Cobalt Boride (CoB) Sputtering Targets
Hafnium Boride (HfB2) Sputtering Target
Iron Boride (FeB) Sputtering Target
Lanthanum HexaBoride (LaB6) Sputtering Target
Magnesium Diboride (MgB2) Sputtering Targets
Molybdenum Diboride (Mo2B) Sputtering Target
Molybdenum Boride (Mo2B5) Sputtering Target
Neodymium Boride (NdB) Sputtering Target
Neodymium Diboride (NdB2) Sputtering Target
Nickel Diboride (Ni2B) Sputtering Targets
Niobium Diboride (NbB2) Sputtering targets
Tantalum Boride (TaB) Sputtering Target
Tantalum Diboride (TaB2) Sputtering Target
Titanium Boride(TiB2) Sputtering Target
Tungsten Boride (WB) Sputtering Target
Tungsten Boride (WB2) Sputtering Target
Vanadium Boride (VB) Sputtering Target
Vanadium Boride (VB2) Sputtering Target
Zirconium Boride (ZrB2) Sputtering Target
:Sulfide Ceramic Sputtering Target
Arsenic Sulfide (As2S3) Sputtering Target
Antimony Sulfide (Sb2S3) Sputtering Target
Bitsmth Sulfide (Bi2S3) Sputtering Target
Cadmium  Sulfide (CdS ) Sputtering Target
Copper Sulfide (CuS) Sputtering Target
Copper Sulfide (Cu2S) Sputtering Target
Gallium Sulfide (GaS) Sputtering Target
Gallium Sulfide (Ga2S3) Sputtering Target
Germanium Sulfide (Ge2S3) Sputtering Target
Indium Sulfide (In2S3) Sputtering Target
Iron Sulfide(FeS) Sputtering Target
Lead Sulfide (PbS) Sputtering Target
Manganese Sulfide(MnS2) Sputtering Target
Molybdenum Sulfide (MoS2) Sputtering Target
Niobium Sulfide (NbS1.75) Sputtering Target
Silver Sulfide (AgS. Ag2S) Sputtering Target
Tantalum Suflfide (TaS2) Sputtering Target
Tin Sulfide (SnS) Sputtering Target
Tin Sulfide (SnS2) Sputtering Target
Tungsten Sulfide (WS2) Sputtering Target
Zinc Sulfide (ZnS) Sputtering Target
:Selenide Ceramic Sputtering Target
Aluminium Selenide (Al2Se3) Sputtering Target
Antimony Selenide (Sb2Se3) Sputtering Target
Arsenic Selenide (As2Se3) Sputtering Target
Bismuth Selenide  (BiSe) Sputtering Target
Bismuth Selenide  (Bi2Se3) Sputtering Target
Cadmium Selenide (CdSe) Sputtering Target
Copper Selenide (CuSe) Sputtering Target
Copper Selenide (Cu2Se) Sputtering Target
Gallium Selenide (Ga2Se3) Sputtering Target
Gemarnium Arsenic Selenide (Ge2As4Se4) Sputtering Target
Gemarnium Selenide (Ge2Se3) Sputtering Target
Indium Selenide (In2Se3) Sputtering Target
Lead Selenide (PbSe) Sputtering Target
Molybdenum Selenide (MoSe2) Sputtering Target
Manganese Selenide (MnSe) Sputtering Target
Niobium Selenide (NbSe2) Sputtering Target
Tantalum Selenide (TaSe2) Sputtering Target
Tungsten Selenide (WSe2) Sputtering target
Zinc Selenide (ZnSe)
Telluride Sputtering Target
Arsenic Telluride (As2Te3) sputtering target
Aluminium Telluride (Al2Te3) sputtering target
Antimony Telluride (Sb2Te3) sputtering target
Bismuth Telluride (Bi2Te3) sputtering target
Cadmium Telluride (CdTe) sputtering target
Copper Telluride (CuTe) sputtering target
Copper Telluride (Cu2Te) sputtering target
Gallium Telluride (Ga2Sb2Te5) sputtering target
Gallium Telluride (Ga2Te3) sputtering target
Gernium Telluride (Ge2Te3) sputtering target
Lead Telluride (PbTe) sputtering target
Molybdenum Telluride (MoTe2) sputtering target
Niobium Telluride (NbTe2) sputtering target
Silver Telluride (Ag2Te) sputtering target
Tantalum Telluride ( TaTe2) sputtering target
Tin Telluride (SnTe) sputtering target
Tungsten Telluride (WTe2) sputtering target
Zinc Telluride (ZnTe) sputtering target
:Antimonide Sputtering Target
Indium Antimonide (InSb) Sputtering target
Gallium Antimonide (GaSb) sputtering target
Nickel Antimonide (NiSb) sputtering target
:Arsenide Sputtering Target
Indium Arsenide (InAs) sputtering target
Tin Arsenide (SnAs) sputtering target
Gallium Arsenide (GaAs) sputtering target
دسته‌بندی‌ها:
محصولات: